PATTERN DISTORTION CORRECTING DEVICE, PATTERN DISTORTION CORRECTING METHOD AND RECORDING MEDIUM RECORDED WITH PATTERN DISTORTION CORRECTING PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a pattern distortion correcting device which corrects the distortion of a layout pattern while taking not only an edge shift quantity but a process margin as well into consideration. SOLUTION: The pattern distortion correcting device has a finish pattern predicting section 16 for predicting the finish pattern of the layout pattern, an edge shift measuring section 17 for measuring the edge shift quantity which a deviation between the predicted finish pattern and a reference pattern, a process margin measuring section 24-N for measuring the process margin of the predicted finish pattern, a measurement result deciding section 18 for deciding whether the measured edge shift quantity and the measured process margin satisfy criteria and a layout pattern temporally correcting section 19 for correcting the layout pattern so as to satisfy the criteria in accordance with the decision result by the measurement result deciding section 18.