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Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma

机译:具有磁约束等离子体的磁增强感应耦合等离子体反应器

摘要

The invention is embodied in a plasma reactor including a chamber enclosure having a process gas inlet and including a ceiling, a sidewall and a workpiece support pedestal capable of supporting a workpiece at a plasma processing location facing the ceiling, the workpiece processing location and ceiling defining a process region therebetween, the pedestal being spaced from said sidewall to define a pumping annulus therebetween having inner and outer walls, to permit process gas to be evacuated therethrough from the process region. The invention further includes a pair of opposing plasma confinement magnetic poles arranged adjacent the annulus within one of the inner and outer walls of the annulus, the opposing magnetic poles being axially displaced from one another the opposite poles being oriented to provide maximum magnetic flux in a direction across the annulus and a magnetic flux at the processing location less than the magnetic flux across the annulus.
机译:本发明体现在一种等离子体反应器中,该等离子体反应器包括具有处理气体入口的腔室外壳,该腔室外壳包括顶板,侧壁和能够在面对顶板的等离子处理位置上支撑工件的工件支撑台,该工件处理位置和顶板限定在其间具有处理区域,该基座与所述侧壁间隔开以在其间限定具有内壁和外壁的泵送环带,以允许从处理区域中抽出处理气体。本发明还包括一对相对的等离子体约束磁极,其在环的内壁和外壁中的一个内壁上与环相邻地布置,该相对的磁极彼此轴向移位,该相对的磁极被定向为在一个磁环中提供最大的磁通量。穿过环面的方向和处理位置处的磁通量小于穿过环面的磁通量。

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