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Method and apparatus for multilayer film deposition utilizing rotating multiple magnetron cathode device
Method and apparatus for multilayer film deposition utilizing rotating multiple magnetron cathode device
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机译:利用旋转多磁控阴极装置进行多层膜沉积的方法和设备
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摘要
An apparatus for forming a multilayer film on a substrate surface comprises a multi-target sputtering source having a planar end face adapted for rotation about a central axis and including at least a pair of independently operable planar magnetron cathodes having sputtering targets composed of different materials, and a substrate mounting means for providing a stationary substrate in spaced-apart, facing relation to the sputtering source. According to the inventive method, the multi-target source is rotated about its central axis while the substrate is maintained stationary, thereby depositing a multi-layer film stack on the substrate. The invention finds particular utility in the formation of superlattice structures usable as recording medium layers in the fabrication of magnetic and magneto-optical (MO) data/information storage and retrieval media.
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