Electron beam apparatus using electron source, spacers having high-resistance film and low-resistance layer, and image-forming device using the same

摘要

This invention provides an arrangement for alleviating the electric charge of members apt to be electrically charged such as spacers used in an electron beam apparatus by arranging a high resistance film thereon. Particularly, the low resistance layer arranged at each of the members is covered by a high resistance film to suppress any electric discharges.