首页>
外国专利>
Method of dehydroxylating a hydroxylated material and method of making a mesoporous film
Method of dehydroxylating a hydroxylated material and method of making a mesoporous film
展开▼
机译:使羟基化的材料脱羟基的方法和中孔膜的制备方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention is a method of dehydroxylating a silica surface that is hydroxylated having the steps of exposing the silica surface separately to a silicon organic compound and a dehydroxylating gas. Exposure to the silicon organic compound can be in liquid, gas or solution phase, and exposure to a dehydroxylating gas is typically at elevated temperatures. In one embodiment, the improvement of the dehydroxylation procedure is the repetition of the soaking and dehydroxylating gas exposure. In another embodiment, the improvement is the use of an inert gas that is substantially free of hydrogen. In yet another embodiment, the present invention is the combination of the two-step dehydroxylation method with a surfactant templating method of making a mesoporous film.
展开▼