POLYPROPYLENE RESIN COMPOSITION WITH GOOD SLIP PROPERTY AND ADHESIVE PROPERTY TO POLYPROPYLENE FILM FOR EXTRUSION COATING

摘要

A method for making a mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto a semiconductor substrate by use of an optical exposure tool. The method includes the steps of de-composing the existing mask patterns into arrays of "imaging elements". The imaging elements are pi-phase shifted and are separated by non-phase shifting and sub-resolution elements referred to as anti-scattering bars (ASBs). In essence, the ASBs are utilized to de-compose the larger-than-minimum-width mask features to form "halftone- like" imaging patterns. The placement of the ASBs and the width thereof are such that none of the pi-phase shifting elements are individually resolvable, but together they form patterns substantially similar to the intended mask features.