首页> 外国专利> PROCESS FOR PRODUCING A CIRCUITRY COMPRISING CONDUCTING TRACKS PADS AND MICROVIAS THE USE OF THIS PROCESS FOR THE PRODUCTION OF PRINTED CIRCUITS AND OF MULTILAYER MODULES HAVING A HIGH INTEGRATION DENSITY CIRCUITS USING THE SAME AND PRINTED CIRCUITS AND MULTILAYER MODULES HAVING THE CIRCUITS USING THE SAME

PROCESS FOR PRODUCING A CIRCUITRY COMPRISING CONDUCTING TRACKS PADS AND MICROVIAS THE USE OF THIS PROCESS FOR THE PRODUCTION OF PRINTED CIRCUITS AND OF MULTILAYER MODULES HAVING A HIGH INTEGRATION DENSITY CIRCUITS USING THE SAME AND PRINTED CIRCUITS AND MULTILAYER MODULES HAVING THE CIRCUITS USING THE SAME

机译:生产包含导电轨迹板和微电子线路的过程,该过程用于生产印刷电路和多层模块的过程,使用相同的电路和印刷电路和多层电路,具有很高的集成密度电路。

摘要

PURPOSE: A process for producing a circuitry comprising conducting tracks, pads and microvias, the use of this process for the production of printed circuits and of multilayer modules having a high integration density, circuits using the same, and printed circuits and multilayer modules having the circuits using the same are provided to attach copper on the dielectric surface fixedly and achieve a small size microvias. CONSTITUTION: In a method for making a circuitry comprising conductive tracks, chips and micro-vias, at the top surface of a dielectric(303) consisting of a polymer matrix, a compound capable of inducing subsequent metallization and, if required one or several non-conductive and inert fillers, the dielectric(303) covering a level of circuitry(302) or metalized layer, which comprises steps which consist in perforating right through the dielectric(303) without perforating the subjacent metalized layer or the subjacent level of circuitry(302), so as to form one or several micro-vias at desired sites, forming, by metallization, metal tracks, chips and micro-vias at the surface of the dielectric and of the micro-vias, while providing selective protection by depositing a protective layer.
机译:用途:生产包括导电迹线,焊盘和微孔的电路的方法,该方法在生产印刷电路和具有高集成密度的多层模块中的用途,使用该电路的电路,以及具有印刷电路和多层模块的电路提供使用该电路的电路,以将铜固定在电介质表面上,并实现小尺寸的微孔。组成:一种在包括聚合物基体的电介质(303)的顶表面上制作包含导电迹线,芯片和微孔的电路的方法,该化合物能够诱导后续的金属化,如果需要,还可以诱导一个或多个非金属化-导电和惰性填充剂,电介质(303)覆盖电路(302)或金属化层的水平,其包括以下步骤:直接穿过介质(303)穿孔,而不对下面的金属化层或电路的下面的水平进行穿孔302),以便在所需位置形成一个或几个微通孔,通过金属化在电介质和微通孔的表面上形成金属走线,芯片和微通孔,同时通过淀积绝缘膜来提供选择性保护。保护层。

著录项

  • 公开/公告号KR20020022123A

    专利类型

  • 公开/公告日2002-03-25

    原文格式PDF

  • 申请/专利权人 KERMEL;

    申请/专利号KR20010005708

  • 发明设计人 CASSAT ROBERT;LORENTZ VINCENT;

    申请日2001-02-06

  • 分类号H05K3/40;

  • 国家 KR

  • 入库时间 2022-08-22 00:31:22

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