Generation method of data for used in mask including dummy pattern groups having density continuously adjusted in according to density of local design pattern and recording media in which the same recorded

摘要

PURPOSE: A method for generating mask data including a dummy pattern group with a density continuously controlled according to a pattern density is provided to continuously control the density of dummy patterns formed in the periphery of a local region pattern according the pattern density in each local region of a semiconductor chip design layout, by rapidly generating mask data including at least one dummy pattern. CONSTITUTION: Data of a chip design layout is read from a database of the chip design layout. A chip design layout region is divided into a plurality of buckets. The local pattern density in each bucket is calculated and a dummy region is extracted. The dummy pattern group composed of at least one dummy pattern with a density continuously controlled according to the local pattern density of each bucket is disposed in the dummy region of each bucket in accordance with specifications of a target density and a dummy pattern.