3 SYSTEM AND METHOD OF GENERATING THREE-DIMENSIONAL STRUCTURE FOR NUMERICAL ANALYSIS

摘要

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a numerical analysis technique for simulation of semiconductor processes, and in particular, an initial step required to generate a mesh structure to perform numerical analysis on a structure having a complex three-dimensional geometric shape formed on a wafer during semiconductor manufacturing. Provides a technique for generating structure generation files.;According to the present invention, in order to generate node information, polygon information, polyhedron information, initial condition information, etc. for a numerical analysis mesh structure for a three-dimensional structure, two-dimensional mask data, three-dimensional structure transformation information, structure loading information, material information, By providing a graphic user environment for inputting curved surface information and a file generation module, an initial structure generation file including node information, polygon information, polyhedron information, and initial condition information required for mesh generation may be generated. In addition, by creating a surface data file containing coordinate data for complex structures with curved surfaces, it is possible to refer to complex structures with curved surfaces during meshing. As a result, it is possible to reduce the time required to generate the mesh structure required for the numerical simulation simulation of the complex structure, and to easily regenerate the mesh even with the structural change.