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ORGANOMETALLIC COMPLEX PROCESS FOR THE PREPARATION THEREOF AND METAL ORGANIC CHEMICAL VAPOR DEPOSITION USING SAME
ORGANOMETALLIC COMPLEX PROCESS FOR THE PREPARATION THEREOF AND METAL ORGANIC CHEMICAL VAPOR DEPOSITION USING SAME
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机译:制备有机物的复杂方法和使用相同方法制备金属有机化学气相沉积的方法
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摘要
The present invention relates to an organometallic complex of Chemical Formula 1, a method for preparing the same, and an organometallic chemical vapor deposition method using the same. Since the organometallic complex of the present invention has high thermal stability and excellent vaporization properties even at low temperatures, the organometallic chemical vapor deposition method (MOCVD, metal organic chemical vapor deposition) can be used to efficiently produce a thin film.;(Wherein M, m, R 1 , R 2 , R 3 , and R 4 are as defined in the specification).
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