首页> 外国专利> Forming conducting coatings on substrate through hole walls involves applying covering coating on one side, coating with electrically conducting material, removing covering coating

Forming conducting coatings on substrate through hole walls involves applying covering coating on one side, coating with electrically conducting material, removing covering coating

机译:通过孔壁在基板上形成导电涂层,包括在一侧涂覆盖涂层,用导电材料涂覆,去除覆盖涂层

摘要

The method involves coating the substrate (1) with a covering coating (6) on one side (5) so that the wall (9) of the through holes (2-4) at the ends (8) on this side of the substrate are coated with the material around their periphery, coating the substrate with an electrically conducting material and removing the covering coating.
机译:该方法包括在一侧(5)上用覆盖涂层(6)涂覆基板(1),以使通孔(2-4)的壁(9)在基板这一侧的端部(8)上。用它们周围的材料涂覆硅树脂,用导电材料涂覆衬底,并去除覆盖涂层。

著录项

  • 公开/公告号DE10044540C1

    专利类型

  • 公开/公告日2002-01-31

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE2000144540

  • 申请日2000-09-05

  • 分类号H01L21/60;H01L23/538;H01L21/768;H05K3/42;

  • 国家 DE

  • 入库时间 2022-08-22 00:27:28

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