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Novel borosilane compounds useful for the production of ceramic fibers, ceramic coatings, molded articles, film and/or ceramic microstructures by injection molding or lithographic processes

机译:新型硼硅烷化合物,可用于通过注塑或光刻工艺生产陶瓷纤维,陶瓷涂层,模制品,薄膜和/或陶瓷微结构

摘要

New borosilane compounds (1) are claimed. New borosilane compounds of formula (1) are claimed. RxHal3-xSi-NH-BRyHal2-y (1) R = 1-20C hydrocarbon; Hal = Cl, Br or I; x = 1 or 2; y = 0 or 1. Independent claims are also included for the following: (i) A process for the production of a compound of formula (1) by reaction of a compound of formula (2) with a compound of formula (3) at -100 deg C to +25 deg C. (ii) A process for the production of a compound of formula (2) by reaction of a compound of formula (4) with a compound of formula (5). (iii) Borosilazane compounds of formula (6). (iv) A process for the production of the borosilazane compound of formula (6) by reaction of a compound of formula (1) with at least a 4-8 fold molar quantity of a compound of formula (7) at -80 to +300 deg C. (v) Oligo- or polyborosilazane compounds prepared by reaction of a compound of formula (1) and/or a compound of formula (6) with a compound of formula (7) or by polymerization of a compound of formula (1) or formula (4) so that it contains the structural groups C-Si-N-B, Si-N-B-C and/or C-Si-N-B-C. (vi) A process for the production of a siliconboroncarbonitride ceramic by heat treatment of a borosilazane compound of formula (6) or an oligo- or polyborosilazane compound in an inert or an amine and/or NH3-containing atmosphere at 800-1700 deg C. (vii) The resulting silicon boroncarbonitride ceramic containing C-Si-N-B, Si-N-B-C and/or C-Si-N-B-C structural units and greater than 93 wt.% Si, N, B and C. (viii) A process for the production of a composite ceramic of SiC, Si3N4 and BN by heating a siliconboroncarbonitride ceramic at above 1700 deg C. (ix) The resulting composite ceramic prepared by crystallization of a silicon boroncarbonitride ceramic containing molecularly dispersed SiC, Si3N4 and BN. (x) Ceramic fibers prepared by melt spinning a polyborosilazane compound under an inert atmosphere, treating the spun green fibers, optionally in a separate process step with a reactive gas, preferably NH3, ethylene diamine, trichlorosilane, dichlorosilane, borane-dimethylsulfide adduct, borane-triethylamine adduct, B2H6 or with electromagnetic radiation or particle beam irradiation to render them unmeltable and heating the hardened green fibers at 800-1600 deg C, preferably 1200 deg C. RxHal3-xSi-NH-SiR3 (2) BRyHal3-y (3) RxSiHal4-x (4) R3Si-NH-SIR3 (5) (R'R''N)qRxHal3-x-qSi-NH-BRyHal2-y-z(NR'R'')z (6) R'R''NH (7) R', R'' = H or 1-20C hydrocarbon; q = 0-2; z = 0-2; q+z - 1; x+q = 3; y+z = 2.
机译:要求保护新的硼硅烷化合物(1)。要求保护新的式(1)的硼硅烷化合物。 RxHal3-xSi-NH-BRyHal2-y(1)R = 1-20C烃; Hal = Cl,Br或I; x = 1或2; y = 0或1。对于以下各项,也包括独立权利要求:(i)通过使式(2)的化合物与式(3)的化合物在以下温度反应制备式(1)的方法-100℃至+ 25℃。(ii)通过使式(4)的化合物与式(5)的化合物反应来制备式(2)的化合物的方法。 (iii)式(6)的硼硅氮烷化合物。 (iv)通过使式(1)的化合物与至少4-8倍摩尔量的式(7)的化合物在-80至+下反应来制备式(6)的硼硅氮烷化合物的方法300℃(v)通过式(1)的化合物和/或式(6)的化合物与式(7)的化合物的反应或式(7)的化合物的聚合制备的低聚或聚硼硅氮烷化合物1)或式(4),使其包含结构基团C-Si-NB,Si-NBC和/或C-Si-NBC。 (vi)在惰性或含胺和/或NH 3的气氛中于800-1700℃下通过热处理式(6)的硼硅氮烷化合物或低聚或聚硼硅氮烷化合物来生产碳氮化硼硅陶瓷的方法。 (vii)所得的碳氮化硼硅陶瓷,其包含C-Si-NB,Si-NBC和/或C-Si-NBC结构单元和大于93wt。%的Si,N,B和C。通过在1700℃以上加热碳氮化硼硅陶瓷来生产SiC,Si 3 N 4和BN的复合陶瓷。(ix)通过使包含分子分散的SiC,Si 3 N 4和BN的碳氮化硼硅陶瓷结晶来制备所得的复合陶瓷。 (x)通过在惰性气氛下熔融纺丝聚硼硅氮烷化合物,纺成的生纤维,任选地在单独的工艺步骤中用反应性气体,优选NH 3,乙二胺,三氯硅烷,二氯硅烷,硼烷-二甲硫加合物,硼烷制备的陶瓷纤维-三乙胺加合物B2H6或电磁辐射或粒子束辐照使其不溶并在800-1600摄氏度,最好在1200摄氏度下加热硬化的生纤维.RxHal3-xSi-NH-SiR3(2)BRyHal3-y(3 )RxSiHal4-x(4)R3Si-NH-SIR3(5)(R'R''N)qRxHal3-x-qSi-NH-BRyHal2-yz(NR'R'')z(6)R'R'' NH(7)R',R''= H或1-20C烃; q = 0-2; z = 0-2; q + z -1; x + q <= 3; y + z <= 2。

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