首页> 外国专利> Reduction or removal of the content of silane from gas, especially waste gas, uses alkaline aqueous solution of sodium hypochlorite and sodium hydroxide, useful for producing precipitated silica or silica sol after reaction

Reduction or removal of the content of silane from gas, especially waste gas, uses alkaline aqueous solution of sodium hypochlorite and sodium hydroxide, useful for producing precipitated silica or silica sol after reaction

机译:从次氯酸钠和氢氧化钠的碱性水溶液中减少或除去气体(尤其是废气)中硅烷的含量,可用于反应后产生沉淀的二氧化硅或硅溶胶

摘要

Reduction or removal of the content of silane from gases, especially waste gases, by contact with a solution containing sodium hypochlorite (NaOCl) uses an alkaline aqueous solution containing NaOCl and aqueous sodium hydroxide (NaOH) solution. Independent claims are also included for (1) Aqueous alkaline NaOCl solution containing NaOH for use in this process, produced by mixing aqueous NaOH solution and aqueous NaOCl solution during or before the reaction, optionally with addition of water; (2) Apparatus with a packed column for operating the process.
机译:通过与包含次氯酸钠(NaOCl)的溶液接触来减少或除去气体中的硅烷含量,方法是使用包含NaOCl和氢氧化钠(NaOH)水溶液的碱性水溶液。 (1)用于该方法的含NaOH的碱性NaOCl水溶液,是通过在反应过程中或反应之前将NaOH水溶液和NaOCl水溶液混合,任选地加入水而制得的; (2)具有用于操作过程的填充柱的设备。

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