Periodic structure spacing measuring method for semiconductor wafer or photomask uses distance between detected maxima in Fourier transformation of image of periodic structure

摘要

The spacing measuring method has an image of the integrated circuit or photomask exhibiting the periodic structure subjected to a Fourier transformation, with detection of a maximum of the first order and a maximum of zero order within the Fourier transformation and calculation of the spacing of the periodic structure from the distance between the detected maxima.