Semiconducting substrate holder for chemical-mechanical polishing has base body, protruding guide ring attached to base body, protruding step, sealing film on main surface and step

摘要

The device has a base body (4) with a first main surface (9), a guide ring (7) attached to the base body and protruding above the main surface by a first height (11), a step (5) arranged laterally to the main surface next to the guide ring and protruding above the main surface by a second height (12) and a sealing film (6) arranged on the first main surface of the base body and on the step.