Screen printing relief layer, e.g. on glass substrate uses screen with thick photoresist on side towards substrate on woven fabric of specified fineness

摘要

Screen printing substrates has relief layers of a fluid, curable composition, in which a light-sensitive photoresist is applied to the side of the screen towards the substrate, exposed and washed out. The photoresist is applied in a thickness of 80 - 2000 microns. The screen is made from woven fabric with a fineness of 60 - 325, preferably 60 - 180 mesh/inch. An Independent claim is also included for a similar process, in which the substrate has relief area(s), surrounded by stencil-type adapter layer, cut out of elastomer or plastomer, which is applied to the side of the screen towards the substrate.