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Process for marking glass comprises selecting the marking position along a drawing process having a glass transition temperature above the transformation temperature
Process for marking glass comprises selecting the marking position along a drawing process having a glass transition temperature above the transformation temperature
Process for marking glass comprises selecting the marking position along a drawing process having a glass transition temperature above the transformation temperature; and subjecting the glass to a laser pulse to apply a mark to one surface of the glass. An Independent claim is also included for a device for marking glass. Preferred Features: The laser pulse only briefly reaches a peak power depending on the physical parameters of the glass. The glass is moved relative to the laser beam. The laser pulse has a build up time of 25-60 micro s and a fall time of 25-60 micro s. The laser pulse has a width of less than 300, preferably less than 130, especially less than 60 micro s. The laser pulse is produced from a CO2 laser.
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