首页> 外国专利> Purification of tantalum compounds by combining with a fluoride-containing compound, other than hydrofluoric acid, and sulfuric acid to form a solution and then separating off the tantalum content

Purification of tantalum compounds by combining with a fluoride-containing compound, other than hydrofluoric acid, and sulfuric acid to form a solution and then separating off the tantalum content

机译:通过与氢氟酸以外的含氟化合物和硫酸混合形成溶液,然后分离出钽中的钽,从而纯化钽化合物

摘要

Purification of tantalum (Ta) compounds involves: (a) combining the impurity-containing Ta compound with a fluoride-containing compound and sulfuric acid (H2SO4) to form a solution, the Ta compound being Ta oxide or hydroxide and/or a hydrated ammonium Ta oxide and the fluoride compound being ammonium bifluoride (NH4HF2), sodium fluoride (NaF), potassium fluoride (KF) and/or calcium fluoride (CaF2); and (b) separating the Ta content from the impurities. Independent claims are also included for purifying Ta compounds by: (i) combining impure hydrated ammonium Ta oxide with ammonium bifluoride and H2SO4 to form a solution, separating off the Ta content by adding a soluble K compound to precipitate K fluorotantalate and then filtering to remove the precipitate; or (ii) converting impure Ta oxide to potassium (K) tantalate, combining the tantalate with NaF and H2SO4, separating the Ta content by adding a soluble K compound to precipitate (Na,K)2TaF7 and then filtering off the precipitate.
机译:钽(Ta)化合物的纯化涉及:(a)将含杂质的Ta化合物与含氟化合物和硫酸(H2SO4)合并形成溶液,该Ta化合物为Ta氧化物或氢氧化物和/或水合铵氧化钽和氟化物为氟化氢铵(NH4HF2),氟化钠(NaF),氟化钾(KF)和/或氟化钙(CaF2); (b)从杂质中分离出Ta含量。还包括通过以下方法纯化Ta化合物的独立权利要求:(i)将不纯的水合Ta氧化物铵与氟化氢铵和H2SO4混合形成溶液,通过添加可溶性K化合物以沉淀出氟钽酸钾,然后过滤除去以分离Ta含量。沉淀物或(ii)将不纯的Ta氧化物转化为钽酸钾(K),将钽酸钾与NaF和H2SO4合并,通过添加可溶性K化合物使(Na,K)2TaF7沉淀来分离Ta含量,然后滤出沉淀。

著录项

  • 公开/公告号DE10142692A1

    专利类型

  • 公开/公告日2002-03-14

    原文格式PDF

  • 申请/专利权人 OSRAM SYLVANIA INC. DANVERS;

    申请/专利号DE2001142692

  • 发明设计人 SINGH RAJ P.;MILLER MICHAEL J.;

    申请日2001-08-31

  • 分类号C01G35/00;

  • 国家 DE

  • 入库时间 2022-08-22 00:26:52

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