Multicharged ion beam sweeping using repeated sweeping over a single zone of a substrate with a displacement of the beam after each passage to cover the whole surface of the substrate

摘要

A method for sweeping with multicharged ions forming a beam of given diameter, the sweeping being effected following two axes of a plane of a substrate to be irradiated, consists of effecting a repeated sweeping on a single zone. This repeated sweeping is made up of a number of elementary sweepings each corresponding to two successive passages of the beam and forming a to and fro movement, applying the repeated sweeping with a repetition frequency determined as a function of the predefined number of irradiation passages on the single zone and as a function of the pre-established treatment time for the substrate and realising a displacement of the beam with each passage at an amplitude equal to a fraction of the diameter of the beam in direct relation with this frequency in order to irradiate the whole surface of the substrate. An independent claim is also included for a system of sweeping with multicharged ions generated by a source for putting this method into service.