Data management manner for block exposure and use this the data management device and the charged particle beam exposure system

摘要

PROBLEM TO BE SOLVED: To effectively expose to light by a method wherein a mask area is assigned and a title of exposure data file corresponds to a title of a mask data file in relation to each other on a computer. ;SOLUTION: In exposure control data, a chip area on a semiconductor wafer WH1 corresponds to a mask area on a block mask extracting MP1, and various data in relation to these are related to each other. At this time, regular properties in relating data in the exposure control data exist, and while or after the exposure control data are prepared, contents of a wafer plan file W1F, an automatic exposure plan file WF, a mask plan file M1F or a mask control data file are changed readily. Further, based on relating of the data in the exposure control data, retrieval of related data is readily performed. Thus, a sheet of block mask plate corresponds to a plurality of sorts of semiconductor chips to be effectively exposed to light.;COPYRIGHT: (C)1997,JPO