METHOD FOR FEEDING RAW MATERIAL LIQUID INTO RAW MATERIAL VESSEL USED FOR ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION METHOD AND RAW MATERIAL VESSEL FED WITH THE RAW MATERIAL LIQUID

摘要

PROBLEM TO BE SOLVED: To provide a method for feeding a raw material liquid into a raw material vessel by which the flow rate of the raw material liquid in an MOCVD (organometallic chemical vapor deposition) system can be controlled, and to provide the raw material vessel fed with the raw material liquid.;SOLUTION: The improved method for feeding the raw material liquid into the raw material vessel used for the MOCVD method includes a stage where the inside of the raw material vessel is purged with an inert gas; a stage where the raw material liquid such as a raw material solution prepared, e.g. by dissolving an Ru(EtCp)₂ complex, Ti(iPrO)₂(thd)₂ into an organic solvent is poured into the purged raw material vessel in the ratio of 30 to 99 vol.% of the volume of the raw material vessel; and a stage where an inert gas is fed into the raw material vessel poured with the raw material liquid. The characteristic constitution thereof is that the inert gas is filled into the raw material vessel in the pressure range of 105 to 400 kPa.;COPYRIGHT: (C)2004,JPO