首页> 外国专利> METHOD OF DRESSING ABRASIVE CLOTH FOR DOUBLE-SIDED POLISHER AND DRESSING JIG THEREFOR

METHOD OF DRESSING ABRASIVE CLOTH FOR DOUBLE-SIDED POLISHER AND DRESSING JIG THEREFOR

机译:双面胶除草布的方法及治具的制作

摘要

PROBLEM TO BE SOLVED: To provide a method of dressing abrasive cloth for a double-sided polisher, capable of applying each optimum amount of dressing to two abrasive cloths of different materials, and provide a dressing jig therefor.;SOLUTION: The dressing amount of a hard urethane foam pad 14 by a sintered body 52 on the top surface of a jig substrate 51 is made different from that of a soft non-woven cloth pad 15 by a brush 53 on the bottom surface of the jig substrate 51. This dressing jig 50 is dressed by being positioned between an upper surface table 12 and a lower surface table 13 and moved between the upper surface table 12 and the lower surface table 13 on a plane parallel with the surface. Thus, each optimum amount of dressing can be applied to the two pads 14, 15 of different materials, incorporated into the double-sided polisher 10.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种用于双面抛光机的砂布修整方法,该方法能够将最佳量的修整料施加到两种不同材料的砂布上,并为其提供修整夹具。通过夹具基体51的顶表面上的烧结体52形成的硬质聚氨酯泡沫垫14与通过夹具53基体的底表面上的刷子53的软无纺布垫15的硬度不同。夹具50通过位于上工作台12和下工作台13之间并在与该表面平行的平面上在上工作台12和下工作台13之间移动而进行修整。因此,每一个最佳的修整量可以施加到不同材料的两个垫14、15上,并结合到双面抛光机10中。版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003260656A

    专利类型

  • 公开/公告日2003-09-16

    原文格式PDF

  • 申请/专利权人 SUMITOMO MITSUBISHI SILICON CORP;

    申请/专利号JP20020063754

  • 发明设计人 HARADA SEISHI;ONO ISOROKU;

    申请日2002-03-08

  • 分类号B24B37/00;B24B53/02;B24B53/12;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 00:21:10

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号