Evaluation method and evaluation system and drawing manner and drawing system null of semiconductor circuit

摘要

PURPOSE: To enhance the reliability of a pattern evaluation by so converting as to become a pattern size when a reticle is previously fixed to a pattern transfer unit or a pattern plotter, and evaluating the pattern position. ;CONSTITUTION: The height of a mask 22 in a pattern position measuring unit 20 is measured by a height measuring unit 25, and stored in a memory 26. The height of a mask 32 in a stepper 30 is measured by a height measuring unit 36, and stored in a memory 36. When pieces of storage information in the memories 26, 36 are supplied to positional deviation calculator 41, the calculator 41 obtains the mask shape change from the state installed in the unit 20 to the state installed in the stepper 30, and the positional deviations in X-Y direction of an arbitrary point (X, Y) on the surface of a board due to the shape change is calculated. On the other hand, the pattern information of the mask 22 in the measuring unit is measured by a measuring unit 28, the positional deviation is referred by a corrector 42, corrected, and the pattern is evaluated by an evaluating unit 43.;COPYRIGHT: (C)1996,JPO