首页> 外国专利> MARK, SUBSTRATE WITH LIGHT REFLECTION FILM, METHOD FOR MANUFACTURING LIGHT REFLECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE, AND ELECTRONIC APPARATUS

MARK, SUBSTRATE WITH LIGHT REFLECTION FILM, METHOD FOR MANUFACTURING LIGHT REFLECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE, AND ELECTRONIC APPARATUS

机译:商标,带有反光膜的基材,制造反光膜的方法,液晶显示器和电子设备

摘要

PROBLEM TO BE SOLVED: To provide a mask for manufacturing a light reflection film which lessens the occurrence of interference fringes, the light reflection film formed by using the mask, a method for manufacturing the light reflection film, an optical device provided with the light reflection film which lessens the occurrence of the interference fringes, and an electronic apparatus provided with the light reflection film which lessens the occurrence of the interference fringes.;SOLUTION: The substrate with the light reflection film which is randomly arrayed with a plurality of projecting parts or recessed parts in a plane direction with 100 to 2,000 R, G and B dots or the entire part of a screen as one dot is formed by using the mask for manufacturing the substrate with the light reflection film which is randomly arrayed with light transparent parts or light opaque parts in the plane direction with 100 to 2,000 R, G and B does or the entire part of the screen as one dot.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:为了提供一种用于制造减少干涉条纹的发生的光反射膜的掩模,使用该掩模形成的光反射膜,该光反射膜的制造方法,具有该光反射的光学装置。膜;一种具有减少反射条纹的发生的膜;以及一种电子设备,其具有减少反射条纹的发生的光反射膜。;解决方案:具有光反射膜的基板,其随机排列有多个突出部分或通过使用用于制造具有光反射膜的基板的掩模来形成在平面方向上具有100至2,000个R,G和B点或屏幕的整个部分作为一个点的在平面方向上的凹入部分,该掩模随机地排列有透光部分或R,G和B以100至2,000的R,G和B在平面方向上不透明的部分或整个屏幕为一个点。;版权:(C 2004年,日本特许厅

著录项

  • 公开/公告号JP2003302742A

    专利类型

  • 公开/公告日2003-10-24

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20020108529

  • 申请日2002-04-10

  • 分类号G03F1/08;G02B5/08;G02F1/1335;

  • 国家 JP

  • 入库时间 2022-08-22 00:19:07

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