PLASMA MONITORING DEVICE, PLASMA FILM FORMING PROCESS MONITORING DEVICE, AND METHOD OF CONTROLLING PLASMA TREATMENT PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a plasma monitoring device, that does not require such excess work as the exchange of the band-pass film of an optical system associated with changes in reaction gas, as in an optical-system plasma monitor, is not influenced by contaminants deposited inside a monitoring window, and can be manufactured inexpensively.;SOLUTION: This plasma monitoring device and a method controlling plasma treatment process use means 8 and 11, which detect leakage electromagnetic waves in the vicinity of a plasma treatment device at the time of generating plasma 2 and a processing means, which correlates the detected results of the means 8 and 11 with the results of plasma treatment.;COPYRIGHT: (C)2003,JPO