首页> 外国专利> MANUFACTURING METHOD FOR BOTH-SIDE WIRING TAPE CARRIER AND TAPE CARRIER USING THE SAME

MANUFACTURING METHOD FOR BOTH-SIDE WIRING TAPE CARRIER AND TAPE CARRIER USING THE SAME

机译:双面布线带载带的制造方法和使用该带载带的带载带

摘要

PPROBLEM TO BE SOLVED: To provide a manufacturing method for a both-side wiring tape carrier in the structure that the inside of via hole of an inter-layer connection part is filled with a metal by a plating method without leaving a void inside the plating metal, capable of simplifying processes and performing manufacturing at a low cost. PSOLUTION: A metal coated polyimide base provided with metal layers including at least copper layers on both surfaces without interposing an adhesive material is used, and a pattern for opening the via holes is formed by a photoetching method at the metal layer on one or both surfaces of the metal coated polyimide base. Using the pattern as a mask, a blind via hole is formed in a polyimide layer by a polyimide etching method by an alkali solution or by irradiating the base with a carbon dioxide laser or an Ar laser. The copper layer is exposed by removing the metal layer exposed at an external land via hole bottom surface, and plating is precipitated from the copper layer surface exposed at the blind via hole bottom surface and electrically connected with the metal layer constituting the pattern for opening the via hole. PCOPYRIGHT: (C)2003,JPO
机译:

要解决的问题:提供一种双面布线带载具的制造方法,该构造为通过电镀方法在层间连接部的通孔的内部填充金属而不留空隙的结构。在电镀金属内部,能够简化工艺并以低成本进行制造。

解决方案:使用涂覆有金属的聚酰亚胺基底,该基底在两个表面上均具有至少包括铜层的金属层,而没有插入粘合剂材料,并且通过光刻法在一个金属层上形成用于打开通孔的图案。或金属涂覆的聚酰亚胺基材的两个表面。使用该图案作为掩模,通过聚酰亚胺蚀刻方法通过碱溶液或通过用二氧化碳激光器或氩激光器照射基底来在聚酰亚胺层中形成盲孔。通过去除暴露在通孔底面的外部焊盘上的金属层而暴露出铜层,并且从暴露在盲孔底面的铜层表面析出镀层,并与构成用于开口的图案的金属层电连接。通孔。

版权:(C)2003,日本特许厅

著录项

  • 公开/公告号JP2003273170A

    专利类型

  • 公开/公告日2003-09-26

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL MINING CO LTD;

    申请/专利号JP20020069441

  • 发明设计人 UNNO HIROSHI;KIYAMA KAZUMI;

    申请日2002-03-14

  • 分类号H01L21/60;

  • 国家 JP

  • 入库时间 2022-08-22 00:18:26

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