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Grain growth manner and device null for grain growth

机译:晶粒长大的方式和装置

摘要

An apparatus for crystal growth includes a solid-state component (42) having a region (42a) whose valence electrons have been controlled so as to control the concentration of holes or electrons of a surface portion in response to the environment of a solution (43) containing a macromolecular compound, a pair of counter electrodes (44a) and (44b) provided to hold therebetween a space above the region (42a), and electric insulating materials (46a) and (46b) supporting the counter electrodes (44a) and (44b). The region (42a) is an impurity region formed on a silicon semiconductor substrate. In the crystal growth method, an electric field is applied to the solution (43) across the counter electrodes (44a) and (44b). Under an electric state generated on the surface of the region (42a), a crystal of the macromolecular compound is formed from the solution (43) to which the electric field is applied. IMAGE
机译:用于晶体生长的装置包括具有区域(42a)的固态成分(42),该区域的价电子已经被控制,以便响应溶液的环境来控制表面部分的空穴或电子的浓度(43) )包含高分子化合物,一对对电极(44a)和(44b),以保持在区域(42a)上方的空间之间;以及电绝缘材料(46a)和(46b),支撑对电极(44a)和(44b)。区域(42a)是在硅半导体衬底上形成的杂质区域。在晶体生长方法中,电场穿过反电极(44a)和(44b)施加到溶液(43)。在区域(42a)的表面上产生的电状态下,由施加了电场的溶液(43)形成高分子化合物的晶体。 <图像>

著录项

  • 公开/公告号JP3360616B2

    专利类型

  • 公开/公告日2002-12-24

    原文格式PDF

  • 申请/专利权人 住友金属工業株式会社;

    申请/专利号JP19980227878

  • 发明设计人 三城 明;

    申请日1998-08-12

  • 分类号C30B29/58;B01D9/02;

  • 国家 JP

  • 入库时间 2022-08-22 00:18:20

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