首页> 外国专利> METHOD FOR MACHINING SILICON, INK JET HEAD PRODUCTION SYSTEM, INK JET HEAD, INK JET RECORDER, INK JET RECORDING METHOD, SYSTEM AND METHOD FOR PRODUCING COLOR FILTER, SYSTEM AND METHOD FOR PRODUCING FIELD EMISSION SUBSTRATE, AND SYSTEM AND METHOD FOR PRODUCING MICROARRAY

METHOD FOR MACHINING SILICON, INK JET HEAD PRODUCTION SYSTEM, INK JET HEAD, INK JET RECORDER, INK JET RECORDING METHOD, SYSTEM AND METHOD FOR PRODUCING COLOR FILTER, SYSTEM AND METHOD FOR PRODUCING FIELD EMISSION SUBSTRATE, AND SYSTEM AND METHOD FOR PRODUCING MICROARRAY

机译:加工硅的方法,喷墨头生产系统,喷墨头,喷墨记录器,喷墨记录方法,生产彩色滤光片的系统和方法,生产场发射基质的系统和方法,以及微阵列的生产系统和方法

摘要

PROBLEM TO BE SOLVED: To obtain a method for machining silicon in which the yield of ink jet head can be increased by suppressing occurrence of micro defects at the time of machining a silicon substrate, and a recorder, e.g. a printer, a color filter production system, a field emission substrate production system, and the like, employing an ink jet head produced by that method.;SOLUTION: After metals adhering to the silicon surface are removed by SC-2 cleaning, or the like, the silicon is heat treated and machined.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:获得一种用于加工硅的方法,其中通过抑制在加工硅基板时产生的微缺陷而可以提高喷墨头的产量,并且还提供了一种记录器,例如记录仪。打印机,彩色滤光片生产系统,场致发射基板生产系统等,采用通过该方法生产的喷墨头;解决方案:通过SC-2清洁去除附着在硅表面上的金属后,或例如,对硅进行热处理和加工。;版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003276208A

    专利类型

  • 公开/公告日2003-09-30

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20020080460

  • 发明设计人 YAMAZAKI SEIJI;

    申请日2002-03-22

  • 分类号B41J2/16;B41J2/01;G02B5/20;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:47

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