首页> 外国专利> OPTICAL TEST SYSTEM INCLUDING INTERFEROMETER WITH MICROMIRROR AND PIEZOELECTRIC TRANSLATOR FOR CONTROLLING TEST PATH MIRROR

OPTICAL TEST SYSTEM INCLUDING INTERFEROMETER WITH MICROMIRROR AND PIEZOELECTRIC TRANSLATOR FOR CONTROLLING TEST PATH MIRROR

机译:包含微镜干涉仪和压电翻译器的光学测试系统,用于控制测试路径反射镜

摘要

PPROBLEM TO BE SOLVED: To provide an adjustable optical system that determines aberration in a source beam by comparing a test beam with a reference beam. PSOLUTION: This optical system includes a test source for producing the source beam having a spatial intensity distribution including an aberration component, a wavefront analyzer for processing a fringe signal associated with the aberration component, and an interferometer interposed between the test source and wavefront analyzer. The interferometer includes a beamsplitter for splitting the source beam into the test beam and reference beam, a mirror disposed in the test beam path, and a micromirror disposed in the interference beam path. The micromirror reflects a central position of the ference beam toward an imaging device and allows an outer portion of the reference beam to pass thereby. Therefore, this optical system is not affected by the aberration existing in the source beam. PCOPYRIGHT: (C)2003,JPO
机译:

要解决的问题:提供一种可调整的光学系统,该系统通过将测试光束与参考光束进行比较来确定源光束的像差。解决方案:该光学系统包括:一个测试源,用于产生具有空间强度分布的源光束,该空间强度分布包括一个像差分量;一个波前分析仪,用于处理与该像差分量相关的条纹信号;以及干涉仪,介于该测试源和波前分析仪。干涉仪包括用于将源光束分成测试光束和参考光束的分束器,设置在测试光束路径中的镜和设置在干涉光束路径中的微镜。微镜将参考光束的中心位置朝向成像装置反射,并由此使参考光束的外部通过。因此,该光学系统不受源光束中存在的像差的影响。

版权:(C)2003,日本特许厅

著录项

  • 公开/公告号JP2003177006A

    专利类型

  • 公开/公告日2003-06-27

    原文格式PDF

  • 申请/专利权人 DISCOVISION ASSOC;

    申请/专利号JP20020280156

  • 发明设计人 PRIKRYL IVAN;HALL HOLLIS ONEAL II;

    申请日1996-03-15

  • 分类号G01B9/02;G01J9/02;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:27

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