首页> 外国专利> CHARGED PARTICLE BEAM ADJUSTING METHOD, OBSERVATION METHOD AND PROCESSING METHOD USING CHARGED PARTICLE BEAM, AND OBSERVATION DEVICE AND PROCESSING DEVICE USING CHARGED PARTICLE BEAM

CHARGED PARTICLE BEAM ADJUSTING METHOD, OBSERVATION METHOD AND PROCESSING METHOD USING CHARGED PARTICLE BEAM, AND OBSERVATION DEVICE AND PROCESSING DEVICE USING CHARGED PARTICLE BEAM

机译:带电粒子束的调整方法,观察方法及使用带电粒子束的处理方法,观察装置及处理装置的带电粒子束

摘要

PROBLEM TO BE SOLVED: To adjust an axis and a focus of an electron beam in a state of maintaining targeted allowable level of resolving power or the like.;SOLUTION: Electron beam is irradiated and projected with excitation setting condition of respective adjusting coils and lens coils stored in setting condition storage parts 23, 24, and a specimen 8 is observed, and the state of irradiation and projection of the electron beam are detected depending on an observed image (transmission image). Requested excitation condition of respective coils are made to change in compliance with the detected result, and the variation of excitation condition is compared with the criteria corresponding to the targeted allowable level stored in a criteria storage parts 25, 26, at a comparing part 27, and the variation of the excitation condition of the coils changed to exceed the criteria is displayed on an image display part 29 so that the image can be easily and visually recognized.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:在保持目标分辨能力等的允许水平的状态下调节电子束的轴和焦点。解决方案:以相应的调节线圈和透镜的激励设置条件照射和投射电子束。观察存储在设定条件存储部23、24中的线圈和样本8,并根据观察图像(透射图像)检测电子束的照射和投射状态。在比较部27处,使各个线圈的要求励磁条件根据检测结果而变化,并且将励磁条件的变化与对应于存储在标准存储部25、26中的目标容许水平的标准进行比较。并且在图像显示部分29上显示出线圈的励磁条件变化超过标准的变化,从而可以容易地和视觉上识别图像。版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003242922A

    专利类型

  • 公开/公告日2003-08-29

    原文格式PDF

  • 申请/专利权人 JEOL LTD;

    申请/专利号JP20020036831

  • 发明设计人 OKURA YOSHIHIRO;

    申请日2002-02-14

  • 分类号H01J37/21;G03F7/20;H01J37/04;H01J37/22;H01J37/26;H01J37/305;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:20

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