首页> 外国专利> MANUFACTURING METHOD FOR SUBSTRATE WITH RECESSED PART FOR MICROLENS, SUBSTRATE WITH RECESSED PART FOR MICROLENS, MICROLENS SUBSTRATE, OPPOSED SUBSTRATE FOR LIQUID CRYSTAL PANEL, LIQUID CRYSTAL PANEL AND PROJECTION TYPE DISPLAY DEVICE

MANUFACTURING METHOD FOR SUBSTRATE WITH RECESSED PART FOR MICROLENS, SUBSTRATE WITH RECESSED PART FOR MICROLENS, MICROLENS SUBSTRATE, OPPOSED SUBSTRATE FOR LIQUID CRYSTAL PANEL, LIQUID CRYSTAL PANEL AND PROJECTION TYPE DISPLAY DEVICE

机译:微缩零件带底物的基板,微缩零件带底物的基板,微晶基板,液晶面板的对置基板,液晶面板和投影型显示装置的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method for a substrate with a recessed part for a microlens coping with an aspherical lens.;SOLUTION: The substrate with the recessed part for the microlens is manufactured through a process of forming a first mask layer 6 on the surface of a glass substrate 5, a process of forming a first opening 61 on the first mask layer 6, a process of forming a first recessed part 31 on the glass substrate 5 by wet etching, a process of removing the first mask layer 6, a process of forming a second mask layer 63 on the surface of the glass substrate 5, a process of forming a third opening 631 on the second mask layer 63, a process of forming the recessed part on the glass substrate 5 by wet etching, and a process of removing the second mask layer 63.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种具有凹部的基板的制造方法,该凹部的微透镜与非球面透镜对应;解决方案:具有凹部的基板的微透镜通过形成第一掩模层6的工艺来制造。在玻璃基板5的表面上,在第一掩模层6上形成第一开口61的工序,通过湿蚀刻在玻璃基板5上形成第一凹部31的工序,去除第一掩模层的工序参照图6,在玻璃基板5的表面上形成第二掩模层63的工艺,在第二掩模层63上形成第三开口631的工艺,通过湿法蚀刻在玻璃基板5上形成凹陷部分的工艺。 ;以及去除第二掩模层63的过程。版权所有:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2003279949A

    专利类型

  • 公开/公告日2003-10-02

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20020079811

  • 发明设计人 SHIMIZU NOBUO;TSUBOTA SHINICHI;

    申请日2002-03-20

  • 分类号G02F1/1335;G02B3/00;G02B3/02;

  • 国家 JP

  • 入库时间 2022-08-22 00:16:56

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