CERIUM POLISHING MATERIAL, CERIUM POLISHING MATERIAL SLURRY, METHOD FOR POLISHING GLASS SUBSTRATE AND METHOD FOR PRODUCING GLASS SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To obtain a cerium polishing material capable of increasing the polishing rate, slightly causing flaws in a polished surface of a polished material to be polished, having a small surface roughness and good quality, sustaining the high polishing rate over a long period and carrying out polishing with high efficiency.;SOLUTION: The cerium polishing material consists essentially of cerium oxide and has a settling bulk density within the range of 0.8-1.0 g/ml when 10 mass% of the polishing material is dispersed in water. The primary particle diameter is within the range of 40-80 nm and the specific surface area is within the range of 2-5 m²/g.;COPYRIGHT: (C)2003,JPO