MULTIPLE EXPOSURE LITHOGRAPHY SYSTEM AND MULTIPLE EXPOSURE TYPE LITHOGRAPHY SYSTEM

摘要

PROBLEM TO BE SOLVED: To draw circuit patterns subjected to coordinate transformation with high accuracy. ;SOLUTION: The prescribed patterns are formed on a drawing surface by multiple exposure using an exposure unit having a multiplicity of micromirrors arrayed in a matrix form. When the coordinate transformation is necessary, the coordinate of the corresponding position of the micromirrors is subjected to the coordinate transformation, the raster data corresponding to the coordinate data before the coordinate transformation is read out of a bit map memory 52 and stored in an exposure data memory 54. The stored exposure data is applied to the micromirrors corresponding to the coordinate data after the coordinate transformation.;COPYRIGHT: (C)2003,JPO