首页> 外国专利> METHOD FOR MANUFACTURING REFLECTIVE THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY DEVICE HAVING LIGHT SCATTERING SURFACE WITH RUGGED STRUCTURE

METHOD FOR MANUFACTURING REFLECTIVE THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY DEVICE HAVING LIGHT SCATTERING SURFACE WITH RUGGED STRUCTURE

机译:具有凹凸结构的光散射薄膜的反射型薄膜晶体管液晶显示装置的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective thin film transistor (TR) liquid crystal display device, with which a pixel electrode having a rugged structure light scattering surface with an excellent light scattering effect is formed with only a small number of steps and which enhances productivity.;SOLUTION: A TR element formed on a transparent insulating substrate is coated with a photosensitive insulating material layer. The material layer is defocus (DF) exposed utilizing a photomask provided with a plurality of mutually independent block patterns (BP) and a contact hole pattern (CHP) and exposed parts are removed by development. A pixel electrode formed is electrically connected with a drain structure of the TR element. The minimum distance between the independent BPs of the photomask is made shorter than the distance within the allowable limits of resolution of the aligner. The distance between the CHP and the independent BPs is made longer than the distance within the allowable limits. A range of the photosensitive material layer corresponding to the independent PBs is made to be a first exposed region with incomplete exposure and a range thereof corresponding to the contact hole is made to be a second exposed region with complete exposure. An undulating surface and the contact hole are formed by removing an exposed part produced by the DF exposure and development.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种反射型薄膜晶体管(TR)液晶显示装置的制造方法,利用该方法仅形成少量的具有凹凸结构的光散射面且具有优异的光散射效果的像素电极。步骤:解决方案:在透明绝缘基板上形成的TR元件涂有光敏绝缘材料层。利用具有多个相互独立的块图案(BP)和接触孔图案(CHP)的光掩模对材料层进行散焦(DF)曝光,并且通过显影去除暴露的部分。形成的像素电极与TR元件的漏极结构电连接。使光掩模的独立BP之间的最小距离短于在对准器的分辨率的允许极限内的距离。 CHP和独立BP之间的距离要比允许范围内的距离长。使与独立PB相对应的感光材料层的范围成为具有不完全曝光的第一曝光区域,并且使与接触孔相对应的感光材料层的范围成为具有完全曝光的第二曝光区域。通过去除DF曝光和显影产生的裸露部分来形成起伏的表面和接触孔。; COPYRIGHT:(C)2003,JPO

著录项

  • 公开/公告号JP2003215619A

    专利类型

  • 公开/公告日2003-07-30

    原文格式PDF

  • 申请/专利权人 ACER DISPLAY TECHNOLOGY INC;

    申请/专利号JP20020017759

  • 发明设计人 KYO ANKA;RI SHUKUKIN;RAI KANCHU;

    申请日2002-01-25

  • 分类号G02F1/1343;G02F1/1335;G02F1/1368;H01L21/336;H01L29/786;

  • 国家 JP

  • 入库时间 2022-08-22 00:16:07

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