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METHOD FOR MANUFACTURING REFLECTIVE THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY DEVICE HAVING LIGHT SCATTERING SURFACE WITH RUGGED STRUCTURE
METHOD FOR MANUFACTURING REFLECTIVE THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY DEVICE HAVING LIGHT SCATTERING SURFACE WITH RUGGED STRUCTURE
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机译:具有凹凸结构的光散射薄膜的反射型薄膜晶体管液晶显示装置的制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective thin film transistor (TR) liquid crystal display device, with which a pixel electrode having a rugged structure light scattering surface with an excellent light scattering effect is formed with only a small number of steps and which enhances productivity.;SOLUTION: A TR element formed on a transparent insulating substrate is coated with a photosensitive insulating material layer. The material layer is defocus (DF) exposed utilizing a photomask provided with a plurality of mutually independent block patterns (BP) and a contact hole pattern (CHP) and exposed parts are removed by development. A pixel electrode formed is electrically connected with a drain structure of the TR element. The minimum distance between the independent BPs of the photomask is made shorter than the distance within the allowable limits of resolution of the aligner. The distance between the CHP and the independent BPs is made longer than the distance within the allowable limits. A range of the photosensitive material layer corresponding to the independent PBs is made to be a first exposed region with incomplete exposure and a range thereof corresponding to the contact hole is made to be a second exposed region with complete exposure. An undulating surface and the contact hole are formed by removing an exposed part produced by the DF exposure and development.;COPYRIGHT: (C)2003,JPO
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