首页> 外国专利> DISCHARGE PLASMA TREATMENT APPARATUS AND DISCHARGE PLASMA TREATMENT METHOD USING THE SAME

DISCHARGE PLASMA TREATMENT APPARATUS AND DISCHARGE PLASMA TREATMENT METHOD USING THE SAME

机译:放电等离子体处理装置及使用该放电等离子体处理方法

摘要

PROBLEM TO BE SOLVED: To provide a discharge plasma treatment apparatus in which both surfaces of a base material to be treated are stably treated with discharge plasma without bringing into contact with an electrode and which has roll - roll electrodes and a discharge plasma treatment method using the same.;SOLUTION: In the apparatus for treating both surfaces of the base material to be treated which is transported between the electrodes with glow discharge plasma produced by applying electric field between a pair of the roll electrodes each covered with a solid dielectric and introducing a treating gas between the electrodes, rings for holding both ends of the base material to be treated are provided in the vicinity of both ends of the roll electrodes and the base material to be treated is treated while being transported by rotating the electrodes.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种放电等离子体处理装置,该放电等离子体处理装置具有不与电极接触而用放电等离子体稳定地处理被处理基材的两面且具有辊-辊电极和使用该电极的放电等离子体处理方法。解决方案:在用于处理被处理基材表面的设备中,该材料在电极之间通过辉光放电等离子体处理,该辉光放电等离子体是通过在分别覆盖有固体电介质的一对辊式电极之间施加电场并引入电场而产生的在电极之间的处理气体中,在辊式电极的两端附近设置用于保持被处理基材的两端的环,并且通过旋转电极进行输送的同时对被处理基材进行处理。 :(C)2003,日本特许厅

著录项

  • 公开/公告号JP2003154256A

    专利类型

  • 公开/公告日2003-05-27

    原文格式PDF

  • 申请/专利权人 SEKISUI CHEM CO LTD;

    申请/专利号JP20010357855

  • 发明设计人 NAKATAKE SUMIO;

    申请日2001-11-22

  • 分类号B01J19/08;C23C16/50;H05H1/46;

  • 国家 JP

  • 入库时间 2022-08-22 00:14:58

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