首页> 外国专利> NICK TREATING DEVICE AND NICK TREATING METHOD FOR ROTOR WITH BOSS

NICK TREATING DEVICE AND NICK TREATING METHOD FOR ROTOR WITH BOSS

机译:老板转子的微处理装置及微处理方法

摘要

PROBLEM TO BE SOLVED: To provide a nick treating device for a rotor with a boss capable of easily and uniformly removing nicks on a end face from which the boss of the rotor protrudes, and a nick treating method.;SOLUTION: The nick treating device includes a plurality of block-shaped oilstones 2 with a uniform thickness and a disk 3 accommodating oilstones 2, and the disk 3 has the boss accommodating portion 4 accommodating the boss 55 of the inner rotor 51 and the grinding stone accommodating portion 5 accommodating the oilstones 2 securing them flush, and the device is constructed so that the end face 54 of the inner rotor 51 is brought into contact with the oilstones 2 when the boss 55 is accommodated into the above boss accommodating portion 4. The nicks on the end face 54 from which the boss 55 of the inner rotor 1 protrudes can be easily and uniformly removed.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种用于转子的刻痕处理装置,其具有能够容易且均匀地去除转子的突出部从其突出的端面上的刻痕的凸台,以及刻痕处理方法。包括多个厚度均匀的块状油石2和容纳油石2的盘3,并且盘3具有容纳内转子51的凸起55的凸台容纳部分4和容纳油石的磨石容纳部分5。如图2所示,使它们平齐地固定,并且该装置构造成当将凸台55容纳在上述凸台容纳部分4中时,使内转子51的端面54与油石2接触。端面54上的刻痕可以轻松,均匀地从中取出内转子1的凸台55。;版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003220542A

    专利类型

  • 公开/公告日2003-08-05

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP;

    申请/专利号JP20020021759

  • 发明设计人 SHIGA SEISHI;SAKURAI TAKASHI;

    申请日2002-01-30

  • 分类号B24B7/16;

  • 国家 JP

  • 入库时间 2022-08-22 00:14:33

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