DRAWING DATA GENERATING SYSTEM, DRAWING DATA GENERATING METHOD, DRAWING DATA GENERATING PROGRAM, METHOD FOR PRODUCING RETICLE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To generate mask drawing data in which the number of master masks to be generated can be minimized. SOLUTION: The method for generating drawing data comprises a step (S101) for generating chip division information by dividing a chip pattern such that pattern data obtained by enlarging the chip pattern data of a reticle is contained in the drawing area of a master mask, generating chip layout information of the master mask by assigning the division patterns in the chip division information sequentially to the master mask in the ascending order and registering the chip layout information in a master mask chip layout information memory, a step (S102) for generating the chip pattern data of the master mask by dividing each chip according to the chip layout information of the master mask with reference to the chip pattern data of the reticle and registering the chip pattern data of the master mask in a master mask pattern data memory, and a step (S103) for generating master mask drawing data with reference to the chip layout information of the master mask and the chip pattern data of the master mask.