FLUORINE-CONTAINING PHOTOSENSITIVE POLYMER HAVING HYDRATE STRUCTURE AND RESIST COMPOSITION CONTAINING THE SAME

摘要

PPROBLEM TO BE SOLVED: To obtain a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition containing the same. PSOLUTION: The photosensitive polymer has a weight average mol.wt. of 3,000-100,000 and comprises repeating units containing at least one group of the following structures (1) and (2). The resist composition containing the above photosensitive polymer is also provided. PCOPYRIGHT: (C)2003,JPO