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Process for producing titanium material for target, titanium material for target, and sputtering target using the same
Process for producing titanium material for target, titanium material for target, and sputtering target using the same
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机译:用于制造靶材的钛材料,用于靶材的钛材料以及使用该靶材的溅射靶的方法
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摘要
A titanium material for a target has a microstructure in which the grain size is small and uniform and also has a macrostructure of the surface of the titanium material which is non-patterned and is excellent in surface property. A titanium ingot in which Vacuum Arc Remelting or Electron Beam Melting is performed is roughly forged at a temperature from 700° C. up to the &bgr; transformation temperature, and is then forged for finishing at room temperature to 350° C., and is finally annealed.
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