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Process for producing titanium material for target, titanium material for target, and sputtering target using the same

机译:用于制造靶材的钛材料,用于靶材的钛材料以及使用该靶材的溅射靶的方法

摘要

A titanium material for a target has a microstructure in which the grain size is small and uniform and also has a macrostructure of the surface of the titanium material which is non-patterned and is excellent in surface property. A titanium ingot in which Vacuum Arc Remelting or Electron Beam Melting is performed is roughly forged at a temperature from 700° C. up to the &bgr; transformation temperature, and is then forged for finishing at room temperature to 350° C., and is finally annealed.
机译:用于靶的钛材料具有其中晶粒尺寸小且均匀的微结构,并且还具有未图案化的钛材料表面的宏观结构并且表面性质优异。进行真空电弧重熔或电子束熔化的钛锭在约700℃的温度下粗锻。 C.直到&bgr;转变温度,然后锻造以在室温下完成至350℃。 C.,最后退火。

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