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Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing

机译:在抛光过程中在样品上测量点的相对或绝对位置生成特征二维图的方法和系统

摘要

Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing are provided. One method includes scanning a specimen with a measurement device during polishing to generate output signals at measurement spots on the specimen. The method may also include determining a characteristic of polishing at the measurement spots from the output signals. In addition, the method may include determining relative or absolute locations of the measurement spots on the specimen. The method may further include generating a two-dimensional map of the characteristic at the relative or absolute locations of the measurement spots on the specimen. In some embodiments, the relative locations of the measurement spots may be determined from a representative scan path of the measurement device and an average spacing between starting points on individual scans.
机译:提供了用于在抛光期间在样本上的测量点的相对或绝对位置处生成特征的二维图的方法和系统。一种方法包括在抛光期间用测量装置扫描样品以在样品上的测量点处产生输出信号。该方法还可包括根据输出信号确定在测量点处的抛光特性。另外,该方法可以包括确定样品上的测量点的相对或绝对位置。该方法可以进一步包括在样本上的测量点的相对或绝对位置处生成特征的二维图。在一些实施例中,可以根据测量设备的代表性扫描路径和各个扫描的起点之间的平均间隔来确定测量点的相对位置。

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