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Method for electroplating a body-centered cubic nickel-iron alloy thin film with a high saturation flux density
Method for electroplating a body-centered cubic nickel-iron alloy thin film with a high saturation flux density
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机译:饱和磁通密度高的体心立方镍铁合金薄膜的电镀方法
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摘要
A process for electroplating and annealing thin-films of nickel-iron alloys having from 63% to 81% iron content by weight to produce pole pieces having saturation flux density (BS) in the range from 1.9 to 2.3 T (19 to 23 kG) with acceptable magnetic anisotropy and magnetostriction and a coercivity (HC) no higher than 160 A/m (2 Oe). The desired alloy layer properties, including small crystal size and minimal impurity inclusions, can be produced by including higher relative levels of Fe++ ions in the electroplating bath while holding the bath at a lower temperature while plating from a suitable seed layer. The resulting alloy layer adopts a small crystal size (BCC) without significant inclusion of impurities, which advantageously permits annealing to an acceptable HC while retaining the high BS desired.
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机译:一种对铁含量为63%至81%的镍铁合金薄膜进行电镀和退火的方法,以生产饱和磁通密度(B S Sub>)在1.9至0.5之间的极靴。 2.3 T(19至23 kG),具有可接受的磁各向异性和磁致伸缩,矫顽力(H C Sub>)不高于160 A / m(2 Oe)。通过在电镀液中保持较高的Fe +& Sup>离子的相对含量,同时保持较低的温度,可以产生所需的合金层性能,包括较小的晶体尺寸和最小的杂质夹杂物。从合适的种子层电镀。所得合金层采用小的晶体尺寸(BCC),而没有明显地包含杂质,这有利地允许退火至可接受的H C Sub>,同时保留所需的高B S Sub>。
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