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Way to remove Cu line damage after Cu CMP
Way to remove Cu line damage after Cu CMP
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机译:Cu CMP后消除Cu线损伤的方法
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摘要
The invention provides a method and an apparatus that prevent the accumulation of copper ions during CMP of copper lines by performing the CMP process at low temperatures and by maintaining this low temperature during the CMP process by adding a slurry that functions as a corrosion inhibitor.
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