Method and apparatus for running metrology standard wafer routes for cross-fab metrology calibration

摘要

The present invention provides for a method and an apparatus for running metrology standard wafer routes for calibrating metrology data. A processing order for a run of semiconductor devices is determined. A metrology route based upon the processing order is determined. A metrology standard device is routed through the metrology route. Measurement data relating to the metrology standard device being routed though the metrology route is acquired. Metrology data processing upon the acquired measurement data is performed.