首页> 外国专利> PASSIVELY MODE-LOCKED OPTICALLY PUMPED SEMICONDUCTOR EXTERNAL-CAVITY SURFACE-EMITTING LASER

PASSIVELY MODE-LOCKED OPTICALLY PUMPED SEMICONDUCTOR EXTERNAL-CAVITY SURFACE-EMITTING LASER

机译:被动锁模光泵半导体外腔腔激光

摘要

A passively mode-locked optically pumped semiconductor vertical-external-cavity surface-emitting laser (OPS-EXSEL) is disclosed. The laser is mode locked by a semiconductor saturable absorber mirror (SESAM) which forms part of an external cavity. Both the beam-quality limitations of edge-emitting lasers, and the power restrictions of electrically pumped surface-emitting lasers are overcome. The laser uses a semiconductor wafer in which a stack of quantum wells is grown adjacent to a single Bragg-mirror structure. Light from one or more multi-mode high-power diode lasers is focused onto the face of the wafer and pumps the wells by absorption in the barrier regions. The area of the laser mode on the active mirror can be about 104 times larger than the mode area on the facet of an edge-emitting laser, offering scope for the generation of high average power and large pulse energy. At the same time the external cavity enforces fundamental mode operation in a circular, near-diffraction-limited beam. With the laser, sub-picosecond pulse durations are achievable by eliminating coupled cavity effects and by external pulse compression. Band-gap engineering can be used to shape the pulses, or even integrate gain and saturable absorption within the same wafer. Thus, rugged, efficient pulsed laser sources with high average power in a nearly diffraction-limited beam, sub-picosecond pulse durations and multi-GHz repetition rates, which operate in a broad range of wavelengths accessible by bandgap engineering are made possible.
机译:公开了一种无源锁模的光泵浦半导体垂直外腔面发射激光器(OPS-EXSEL)。激光器由形成外部空腔一部分的半导体可饱和吸收镜(SESAM)锁模。克服了边缘发射激光器的光束质量限制和电泵浦表面发射激光器的功率限制。激光器使用半导体晶片,其中在单个布拉格镜结构附近生长了量子阱堆。来自一个或多个多模高功率二极管激光器的光会聚焦在晶片的表面上,并通过在势垒区的吸收来泵浦阱。有源反射镜上激光模式的面积可以比边缘发射激光器的小平面上的模式面积大10 4 倍,为产生高平均功率和大脉冲提供了空间能源。同时,外腔在圆形的,近衍射极限的光束中执行基本模式操作。使用激光,可以通过消除耦合腔效应和外部脉冲压缩来实现亚皮秒级脉冲持续时间。带隙工程可用于整形脉冲,甚至可将增益和饱和吸收积分到同一晶片内。这样,就可以在几乎受限的衍射光束中,具有高平均功率的坚固,高效的脉冲激光源,亚皮秒脉冲持续时间和多GHz重复频率,它们可以在通过带隙工程获得的广泛波长范围内工作。

著录项

  • 公开/公告号IL150788D0

    专利类型

  • 公开/公告日2003-02-12

    原文格式PDF

  • 申请/专利权人 GIGATERA AG;

    申请/专利号IL20010150788

  • 发明设计人

    申请日2001-02-09

  • 分类号7H01SA;

  • 国家 IL

  • 入库时间 2022-08-22 00:02:36

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号