首页> 外国专利> PRESSURE-SENSITIVE CATIONIC POLYMERS OR AMPHOTERIC ONES FROM FREE-RADICAL POLYMERISATION AND THEIR COSMETIC APPLICATIONS OF SUCH POLYMERS

PRESSURE-SENSITIVE CATIONIC POLYMERS OR AMPHOTERIC ONES FROM FREE-RADICAL POLYMERISATION AND THEIR COSMETIC APPLICATIONS OF SUCH POLYMERS

机译:自由基聚合产生的压敏阳离子聚合物或两性离子及其在这类聚合物中的化妆品应用

摘要

New cationic or amphoteric polymers (I), having at least one tertiary or quaternary amino function, show a self-adhesive strength (in terms of the maximum tensile strength) of at least 2 Newtons (N) and contain units derived from at least one of six specific classes of cationic or amphoteric ethylenic monomers. New cationic or amphoteric radical polymers (I), having at least one tertiary or quaternary amino function, show a self-adhesive strength of at least 2 N (preferably 2-100N, especially 5-100 N) and comprise one or more types of units derived from monomers of formulae: CH2=C(R1)-CO-X-R2-NR3R4 (a), CH2=C(R1)-CO-X-R2-N+R3R4R5 . A- (b), CH2=C(R1)-CO-X-R2-Cyc+ .A- (c), CH2=C(R6)-(CO)p-(X)q-R7-N+R8R9-R10-Z (d) or CH2=C(R11)-(CO-X)r-Cyc+-R12-Z (e). R1, R11 = H or Me; R2 = 1-30C divalent linear, branched, cycloaliphatic or aromatic hydrocarbyl (optionally containing one or more O, N or P heteroatoms); R3 - R5 = 1-30C linear, branched, cycloaliphatic or aromatic hydrocarbyl (optionally containing one or more O, N or P heteroatoms); X = O or NH; A- = counter-ion, preferably halide, sulfate, phosphate or carboxylate (e.g. acetate); Cyc+ = monocyclic or fused bicyclic, cycloaliphatic or aromatic system containing a tertiary or quaternary amino function and optionally one or more O, N or P heteroatoms; R6 = H or 1-4C alkyl; R8, R9 = H or 1-4C alkyl (optionally substituted by Z); R7, R10 = divalent hydrocarbyl (optionally interrupted by O), preferably (CH2)n; n = 1-4; p, q, r = 0 or 1; Z = COO-, SO3- or PO3H-; or R7 = group forming a 5-7 membered, aromatic or non-aromatic heterocycle together with R8, R9 or X (if X = NH); R12 = 1-4C divalent hydrocarbyl. An Independent claim is included for cosmetic compositions (A) comprising a cosmetic medium containing (I).
机译:具有至少一个叔或季氨基官能团的新型阳离子或两性聚合物(I),其自粘强度(就最大拉伸强度而言)至少为2牛顿(N),并且包含衍生自至少一种的单元六种特定类别的阳离子或两性烯键式单体中的一种具有至少一个叔或季氨基官能团的新型阳离子或两性自由基聚合物(I)显示出至少2 N(优选2-100N,尤其是5-100 N)的自粘强度,并包含一种或多种类型的衍生自式:CH2 = C(R1)-CO-X-R2-NR3R4(a),CH2 = C(R1)-CO-X-R2-N + R3R4R5的单体的单元。 A-(b),CH2 = C(R1)-CO-X-R2-Cyc + .A-(c),CH2 = C(R6)-(CO)p-(X)q-R7-N + R8R9- R 10 -Z(d)或CH 2 = C(R 11)-(CO-X)r -Cyc + -R 12 -Z(e)。 R1,R11 = H或Me; R 2 = 1-30C二价的直链,支链,脂环族或芳族烃基(任选地含有一个或多个O,N或P杂原子); R3-R5 = 1-30C直链,支链,脂环族或芳族烃基(任选地含有一个或多个O,N或P杂原子); X = O或NH; A- =抗衡离子,优选卤离子,硫酸根,磷酸根或羧酸根(例如乙酸根); Cyc + =含有叔或季氨基官能团和任选地一个或多个O,N或P杂原子的单环或稠合双环,脂环族或芳族系统; R6 = H或1-4C烷基; R8,R9 = H或1-4C烷基(任选地被Z取代); R7,R10 =二价烃基(任选被O中断),优选(CH2)n; n = 1-4; p,q,r = 0或1; Z = COO-,SO3-或PO3H-; R7 =与R8,R9或X一起形成5-7元芳族或非芳族杂环的基团(如果X = NH);或R 12 = 1-4C二价烃基。对于包含含有(I)的化妆品介质的化妆品组合物(A),包括独立权利要求。

著录项

  • 公开/公告号PL357893A1

    专利类型

  • 公开/公告日2003-06-30

    原文格式PDF

  • 申请/专利权人 LOREAL;

    申请/专利号PL20020357893

  • 申请日2002-12-19

  • 分类号C08F220/06;

  • 国家 PL

  • 入库时间 2022-08-22 00:01:26

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