首页> 外国专利> MASTER MEDIUM FOR MAGNETIC TRANSFER INCLUDING RESIN SUBSTRATE INTEGRALLY MOLDED WITH MICRORELIEF OR MICRORECESS PATTERN

MASTER MEDIUM FOR MAGNETIC TRANSFER INCLUDING RESIN SUBSTRATE INTEGRALLY MOLDED WITH MICRORELIEF OR MICRORECESS PATTERN

机译:磁性转移的主要介质,包括树脂基体的微孔或微回弹模型

摘要

35MASTER MEDIUM FOR MAGNETIC TRANSFER INCLUDING RESIN SUBSTRATE INTEGRALLY MOLDED WITH MICRORELIEF OR MICRORECESS PATTERN ABSTRACT OF THE DISCLOSURE A master medium for use in magnetic transfer ofinformation to a magnetic recording medium. The mastermedium includes a resin substrate which is integrallymolded with a microrelief or microrecess pattern beingformed on a surface of the substrate and representing theinformation; and a magnetic layer formed on themicrorelief or microrecess pattern. Preferably, thesubstrate and the microrelief or microrecess pattern areformed by injection molding using an original platehaving a microrecess or microrelief pattern, or the 2Pmethod using the original plate and an ultraviolet-curingresin.
机译:35包括树脂基质在内的磁性转移主介质 集成微孔或微回力模式的模具 披露摘要 用于磁性转移的主要介质信息到磁记录介质。大师介质包括整体形成的树脂基板成型有微浮雕或微凹纹形成在衬底表面上并代表信息;并在其上形成磁性层微浮雕或微凹模式。最好,基材和微浮雕或微凹图案是使用原板注塑成型具有微凹或微浮雕图案或2P原版和紫外线固化的方法树脂。

著录项

  • 公开/公告号SG94761A1

    专利类型

  • 公开/公告日2003-03-18

    原文格式PDF

  • 申请/专利权人 FUJI PHOTO FILM CO. LTD.;

    申请/专利号SG20010000799

  • 发明设计人 MASAKAZU NISHIKAWA;SEIICHI WATANABE;

    申请日2001-02-14

  • 分类号G11B5/86;

  • 国家 SG

  • 入库时间 2022-08-22 00:00:52

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