首页> 外国专利> PHASE MASK DESIGN AND PHASE MASK FOR WRITING OPTICAL FIBRE BRAGG GRATINGS

PHASE MASK DESIGN AND PHASE MASK FOR WRITING OPTICAL FIBRE BRAGG GRATINGS

机译:相掩模设计和用于编写光纤布拉格光栅的相掩模

摘要

The present invention is directed to a system and method for designingefficient multi-channel FBG gratings using a pre-compensated phase mask fordiffracting light for side-writing the grating on an optical fiber core. Adesired phase function of the FBG is generated, specifically tailored to aneffective spacing between the phase mask and the optical fiber core. From thephase function a phase mask is pre-compensated to offset diffraction effectsassociated with each longitudinal position of the FBG receiving light from twocorresponding longitudinal positions of the phase mask substantiallysymmetrically spaced longitudinally relative to each particular longitudinalposition of the FBG. The two corresponding longitudinal positions of the phasemask are spaced longitudinally from each other by a spacing determined by theeffective spacing between the phase mask and fiber core and by the first orderdiffraction angle of light through the phase mask. The design involves Fouriertransformation and optimisation process steps for binory phase gratings.
机译:本发明针对用于设计的系统和方法使用预补偿相位掩模的高效多通道FBG光栅衍射光,以将光栅侧面写入光纤芯。一种生成FBG的所需相位函数,专门针对相位掩模和光纤芯之间的有效间距。来自相位功能相位掩模预先补偿了偏移衍射效应与FBG的每个纵向位置相关联,从两个方向接收光相位掩模的相应纵向位置基本上相对于每个特定的纵向纵向对称地间隔开FBG的位置。相的两个相应的纵向位置面罩在纵向上彼此间隔开相位掩模和光纤纤芯之间的有效间隔以及一阶通过相位掩模的光的衍射角。设计涉及傅立叶二元相位光栅的变换和优化过程步骤。

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