首页> 外国专利> REDUCTION OF DAMAGE INITIATION DENSITY IN FUSED SILICA OPTICS VIA UV LASER CONDITIONING

REDUCTION OF DAMAGE INITIATION DENSITY IN FUSED SILICA OPTICS VIA UV LASER CONDITIONING

机译:通过紫外激光调节降低熔融石英光学元件的损伤起始密度

摘要

The present invention provides a method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects and are better capable of resisting optical deterioration upon exposure for a long period of time to a high-power laser beam having a wavelength of about 360 nm or less. The initiation of laser-induced damage is reduced by conditioning the optic at low fluences below levels that normally lead to catastrophic growth of damage. When the optic is then irradiated at its high fluence design limit, the concentration of catastrophic damage sites that form on the surface of the optic is greatly reduced.
机译:本发明提供了一种降低熔融石英光学器件表面上易于引发激光损伤的位置的密度的方法,从而使光学器件具有更少的灾难性缺陷,并且能够更好地抵抗曝光后的光学劣化对于波长约为360nm或更短的高功率激光束,需要较长的时间。通过将光学元件调至低于通常导致损害的灾难性增长的水平,可以减少激光引起的损害的发生。然后,以高通量设计极限照射光学元件时,在光学元件表面形成的灾难性损坏部位的浓度会大大降低。

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