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REDUCTION OF DAMAGE INITIATION DENSITY IN FUSED SILICA OPTICS VIA UV LASER CONDITIONING
REDUCTION OF DAMAGE INITIATION DENSITY IN FUSED SILICA OPTICS VIA UV LASER CONDITIONING
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机译:通过紫外激光调节降低熔融石英光学元件的损伤起始密度
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摘要
The present invention provides a method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects and are better capable of resisting optical deterioration upon exposure for a long period of time to a high-power laser beam having a wavelength of about 360 nm or less. The initiation of laser-induced damage is reduced by conditioning the optic at low fluences below levels that normally lead to catastrophic growth of damage. When the optic is then irradiated at its high fluence design limit, the concentration of catastrophic damage sites that form on the surface of the optic is greatly reduced.
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