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HIGH THROUGHPUT CHEMICAL ANALYSIS BY IMPROVED DESORPTION/IONIZATION ON SILICON MASS SPECTROMETRY
HIGH THROUGHPUT CHEMICAL ANALYSIS BY IMPROVED DESORPTION/IONIZATION ON SILICON MASS SPECTROMETRY
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机译:改进的硅质谱分析法的高解吸/电离高通量化学分析
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摘要
A method of making improved substrates for desorbing and ionizing analytes takes an n-type semiconductor substrate and provides a strong light source. By focusing the illumination from the light source onto the n-type semiconductor substrate results in at least one lit region on the n-type semiconductor substrate. The substrate is electrochemically etched with a low current during illumination to form at least one sample reservoir, each sample reservoir being formed at a respective lit region on the n-type semiconductor substrate.
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