FIZEAU LENS, INTERFERENCE MEASURING DEVICE, INTERFERENCE MEASURING METHOD, METHOD OF MANUFACTURING PROJECTIVE OPTICAL SYSTEM, AND PROJECTIVE EXPOSURE DEVICE

摘要

An interference measuring device capable of surely suppressing the effect of disturbance on interference measurement, comprising a Fizeau lens having a spherical wave generating lens part for converting a measurement luminous flux ejected from an interferometer into a spherical wave and aplanatic lens with a reference surface and disposed on the inspected surface side of the spherical wave generating lens, wherein the Fizeau lens is disposed opposite to an inspected surface and at least the aplanatic lens is designed so that an interval between the reference surface and the inspected surface is shorter than a distance between the rear surface of the reference surface and the final surface of the spherical wave generating lens part, and the spherical wave generating lens part is separable from the aplanatic lens.